Typical Applications
- Highly corrosive Acids, such as Hydrofluoic Acid, Nitric Acid and Sulfric Acid.
- High Temperatures Chemical Liquid (>100°C).
- Aggressive Solvents, such as Chloroform, Two methyl, Isopropyl Alcohol.
- Aggressive Bases.
- Oxidizing Air/Gas.
Materials of Construction
Filter Media |
PTFE Membrane |
Support Layer |
PFA |
Core/Cage/End Caps |
PFA |
O-rings |
Teflon™ Encapsulated Viton™ |
Effective Filtration Area |
0.7m2/Φ68mm 10 inch |
1.5m2/Φ83mm 10 inch |
Max.Operating Temperature |
170°C |
Max.Differential Pressure |
4bar/50°C |
3bar/110°C |
1.5bar/170°C |
Removal Ratings
1.0μm, 3.0μm, 5.0μm, 10μm
Chemical Compatibility
Chemical |
EPP Series |
PFA Series |
APTF Series |
AET Series |
LPF Series |
Acetic Acid (10%) |
G |
E |
E |
E |
E |
Hydrofluoric Acid (50%) |
G |
E |
E |
E |
E |
Hydrogen Peroxide (30%) |
LR |
E |
G |
LR |
G |
Nitric Acid (conc.) |
NR |
E |
NR |
NR |
NR |
Phosphoric Acid (conc.) |
LR |
E |
G |
E |
G |
Sulfuric Acid (conc.) |
NR |
E |
NR |
LR |
LR |
Ammonium Hydroxide (conc.) |
G |
E |
NR |
NR |
E |
Potassium Hydroxide (conc.) |
G |
E |
NR |
LR |
E |
Sodium Hydroxide (conc.) |
G |
E |
NR |
LR |
E |
TMAH (5%) |
G |
E |
NR |
G |
E |
Aqua Ragia HNO3:HCL |
NR |
E |
NR |
LR |
NR |
BEO; NH4F:HF |
G |
E |
E |
G |
G |
Mixed Acid Etch HNO3 < 20% (HNO3: HF:CH3CO2H) |
LR |
E |
LR |
LR |
LR |
Chrom Phos (H2O:H3PO4:CRO3) |
LR |
E |
G |
G |
G |
N-Methyl Pyrrolidone |
LR |
E |
NR |
G |
G |
Piranha (H2SO4O2) |
NR |
E |
NR |
LR |
NR |
RCAEtch |
NR |
E |
G |
G |
G |
SC1 (RCA Clean) |
NR |
E |
NR |
LR |
LR |
SC2 |
NR |
E |
NR |
LR |
LR |
E = Excellent |
G = Good at Ambient Temperatures |
LR = Limited Resistance |
NR = Not Recommended |
The above data is to be used as a guide only. Testing prior to application is recommended. |